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{'doi': '10.1049/el.2011.3804', 'member_id': '265', 'member': 'Institution of Engineering and Technology (IET)', 'container-title': 'Electronics Letters', 'primary-resource': 'https://digital-library.theiet.org/content/journals/10.1049/el.2011.3804', 'tld': 'theiet.org', 'clearbit-logo': 'https://logo.clearbit.com/theiet.org', 'coaccess': [], 'multiple-resolution': [], 'type': 'JOURNAL ARTICLE', 'published_date': '2012', 'publication': 'Electronics Letters', 'supplementary_ids': None, 'title': 'Mismatch of lateral field metal-oxide-metal capacitors in 180\u2005nm CMOS process', 'name': None, 'id': None, 'location': None, 'display_doi': 'https://doi.org/10.1049/el.2011.3804', 'grant_info': None, 'editors': None, 'authors': 'A. Abusleme | A. Dragone | G. Haller | B. Murmann', 'chairs': None}
https://doi.org/10.1049/el.2011.3804
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