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Enhancement of Coulomb drag in double-layer graphene structures by plasmons and dielectric background inhomogeneity

S. M. Badalyan and F. M. Peeters
Phys. Rev. B 86, 121405(R) – Published 20 September 2012

Abstract

The drag of massless fermions in graphene double-layer structures is investigated over a wide range of temperatures and interlayer separations. We show that the inhomogeneity of the dielectric background in such graphene structures, for experimentally relevant parameters, results in a significant enhancement of the drag resistivity. At intermediate temperatures the dynamical screening via plasmon-mediated drag enhances the drag resistivity and results in an upturn in its behavior at large interlayer separations. In a range of interlayer separations, corresponding to the crossover from strong to weak coupling of graphene layers, we find that the decrease of the drag resistivity with interlayer spacing is approximately quadratic. This dependence weakens below this range of interlayer spacing while for larger separations we find a cubic (quartic) dependence at intermediate (low) temperatures.

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  • Received 20 April 2012

DOI:https://doi.org/10.1103/PhysRevB.86.121405

©2012 American Physical Society

Authors & Affiliations

S. M. Badalyan* and F. M. Peeters

  • Department of Physics, University of Antwerp, Groenenborgerlaan 171, B-2020 Antwerpen, Belgium

  • *Samvel. Badalyan@ua.ac.be

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Issue

Vol. 86, Iss. 12 — 15 September 2012

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