The following article is Open access

Plasma chemistry modeling for an inductively coupled plasma used for the growth of carbon nanotubes

and

Published under licence by IOP Publishing Ltd
, , Citation Ming Mao and Annemie Bogaerts 2011 J. Phys.: Conf. Ser. 275 012021 DOI 10.1088/1742-6596/275/1/012021

1742-6596/275/1/012021

Abstract

A hybrid model, called the hybrid plasma equipment model (HPEM), is used to describe the plasma chemistry in an inductively coupled plasma, operating in a gas mixture of C2H2 with either H2 or NH3, as typically used for carbon nanotube (CNT) growth. Two-dimensional profiles of power density, electron temperature and density, gas temperature, and densities of some plasma species are plotted and analyzed. Besides, the fluxes of the various plasma species towards the substrate (where the CNTs can be grown), as well as the decomposition rates of the feedstock gases (C2H2, NH3 and H2), are calculated as a function of the C2H2 fraction in both gas mixtures.

Export citation and abstract BibTeX RIS

Please wait… references are loading.
10.1088/1742-6596/275/1/012021