Thickness dependence of the martensitic transformation in textured Cu-Al-Ni thin films grown by sputtering on Si (001)

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Abstract

We study the thickness influence on the martensitic transformation in Cu-Al-Ni thin films grown by sputtering on Si (001). Thin films with thicknesses between 0.1 μm and 2.25 μm were grown at 563 K. The analysis of the microstructure reveals a columnar growth with preferred orientation Cu-Al-Ni L21 (001)[100] //Si (001)[100]. The martensitic transformation is strongly suppressed for films thinner than 1.3μm, which can be related with an interfacial layer imposing restitutive forces. This is evidenced in the extended transformation / retransformation ranges and in the absence of hysteresis for 0.15 μm thick films

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